您好,欢迎来到海南中小企业大数据中心及公共服务平台!     请登录   免费注册
专利概况
专利名称 RISK ANALYSIS METHOD OF LAYOUT IN MANUFACTURING FACILITY AND DEVICE
申请号 JP2017127215 申请日
公开(公告)号 JP2019012317A 公开(公告)日 2017-06-29
申请(专利权)人 发明人 MORI SHUICHI; TANAKA MAKOTO
专利来源 国家知识产权局 转化方式
摘要

PROBLEM TO BE SOLVED : To provide an objective and quantitative risk analysis method of layout in manufacturing facility capable of achieving a well-balanced design between the risk and the cost. SOLUTION : The risk analysis method of a layout in a manufacturing facility includes the steps of : defining the importance of each chamber constituting the layout in manufacturing facility; giving a piece of information 101 on the target facility to be input to a room dust simulator 102; calculating changes of dust concentration in each chamber constituting the layout in manufacturing facility; calculating the occurrence frequency on the basis of the calculation result 103; and determining the risk level in each chamber on the basis of the importance of each chamber previously defined by a risk level determination part 104 and the calculated occurrence frequency. SELECTED DRAWING : Figure 1 COPYRIGHT : (C)2019, JPO&INPIT

参与列表

主管部门:海南中小企业服务 | 建设单位:海南商业联合会

版权所有:海南商业联合会 | 备案号:粤ICP备13083911号(ICP加挂服务)@2017