专利名称 | RISK ANALYSIS METHOD OF LAYOUT IN MANUFACTURING FACILITY AND DEVICE | ||
申请号 | JP2017127215 | 申请日 | |
公开(公告)号 | JP2019012317A | 公开(公告)日 | 2017-06-29 |
申请(专利权)人 | 发明人 | MORI SHUICHI; TANAKA MAKOTO | |
专利来源 | 国家知识产权局 | 转化方式 | |
摘要 |
PROBLEM TO BE SOLVED : To provide an objective and quantitative risk analysis method of layout in manufacturing facility capable of achieving a well-balanced design between the risk and the cost. SOLUTION : The risk analysis method of a layout in a manufacturing facility includes the steps of : defining the importance of each chamber constituting the layout in manufacturing facility; giving a piece of information 101 on the target facility to be input to a room dust simulator 102; calculating changes of dust concentration in each chamber constituting the layout in manufacturing facility; calculating the occurrence frequency on the basis of the calculation result 103; and determining the risk level in each chamber on the basis of the importance of each chamber previously defined by a risk level determination part 104 and the calculated occurrence frequency. SELECTED DRAWING : Figure 1 COPYRIGHT : (C)2019, JPO&INPIT |
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