| 专利名称 | Bimodal release profile from dosage forms (tamper-to-resistant) modification | ||
| 申请号 | JP2016516124 | 申请日 | |
| 公开(公告)号 | JP6466417B2 | 公开(公告)日 | 2014-05-27 |
| 申请(专利权)人 | 发明人 | バルンシャイト・ルッツ; ガイスラー・アンヤ; シュヴィーア・ゼバスティアン; デンカー・ヤーナ; ヴェニング・クラウス; シュトラーウプ・シュテファニー | |
| 专利来源 | 国家知识产权局 | 转化方式 | |
| 摘要 |
The invention relates to a pharmaceutical dosage form comprising (i) at least one formed segment (S1), which contains a first pharmacologically active ingredient (A1) and provides prolonged release thereof, and (ii) at least one further segment (S2), which contains a second pharmacologically active ingredient (A2) and provides immediate release thereof, wherein the at least one formed segment (S1) exhibits a higher breaking strength than the at least one further segment (S2) and the at least one formed segment (S1) exhibits a breaking strength of more than 500 N. |
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