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专利概况
专利名称 Bimodal release profile from dosage forms (tamper-to-resistant) modification
申请号 JP2016516124 申请日
公开(公告)号 JP6466417B2 公开(公告)日 2014-05-27
申请(专利权)人 发明人 バルンシャイト・ルッツ; ガイスラー・アンヤ; シュヴィーア・ゼバスティアン; デンカー・ヤーナ; ヴェニング・クラウス; シュトラーウプ・シュテファニー
专利来源 国家知识产权局 转化方式
摘要

The invention relates to a pharmaceutical dosage form comprising (i) at least one formed segment (S1), which contains a first pharmacologically active ingredient (A1) and provides prolonged release thereof, and (ii) at least one further segment (S2), which contains a second pharmacologically active ingredient (A2) and provides immediate release thereof, wherein the at least one formed segment (S1) exhibits a higher breaking strength than the at least one further segment (S2) and the at least one formed segment (S1) exhibits a breaking strength of more than 500 N.

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