专利名称 | Process for the reductive amination of halogen-containing substrates | ||
申请号 | US16565595 | 申请日 | |
公开(公告)号 | US10544087B2 | 公开(公告)日 | |
申请(专利权)人 | Taminco BVBA | 发明人 | Kristof Moonen; Kim Dumoleijn; Kristof Weyne; Jerome Leonard Stavinoha Jr; Zhufang Liu |
专利来源 | 国家知识产权局 | 转化方式 | |
摘要 |
Disclosed is a process for performing a reductive amination of a first functional group in an organic feed substrate, which feed substrate comprises at least one further functional group containing a halogen atom, in the presence of hydrogen, a nitrogen-containing compound, and a catalyst, wherein the presence of the nitrogen-containing compound, expressed in a molar ratio relative to the first functional group in the organic feed substrate, at least during the reaction as long as the conversion of the organic feed substrate has not yet reached 80%, is maintained below a level of 1.3. Further disclosed is a composition of the invention comprising at least 98.0% wt of 2-chloro-benzyl-dimethylamine, at most 0.60% wt of the meso-o-Cl-BDMA dimer and at least 1 ppm wt of the (+/?)-o-Cl-BDMA dimer and any use therefor. |
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